� � SEMICONDUCTORS
� �
4-1. IPA (ISOPROPYL ALCOHOL) / TOKUYAMA
Application
: � � � � � � , � � � � � � � � � � � � � � � � � � � � � � � � .
4-2. SULFURIC ACID (� � � � - H2SO4) / TOKUYAMA, MITSUBISHI
CHEMICAL
Application
: � � � � � � , � � � � � � � � � � � � � � � � � � � � .
4-3. NITRIC ACID (� � � � - HNO3) / MITSUBISHI CHEMICAL
Application
: � � � � � � � � � � � � , � � � � � � � � .
4-4.
HYDROCHLORIC ACID
(� � � � - HCL) / MITSUBISHI CHEMICAL
Application
: � � � � � � � � � � .
4-5.
MIXED ACID (� � � � )
/ MITSUBISHI CHEMICAL
Application
: � � � � � � Etching� �
4-6. HYDROFLUORIC ACID (� � �`�� � - HF) / MITSUBISHI CHEMICAL
/ MORITA CHEMICAL
Application
: � � � � � � � � � � � � � � � �
4-7. AMMONIUM FLUORIDE (� � �`�� � � � ��� � ��� ��� ��� � �� - NH4F) / MITSUBISHI CHEMICAL
Application
: � � � � � � � � � � � � � � � �
4-8. AQUEOUS AMMONIA (� �8� � �0� �( - NH3) / MITSUBISHI CHEMICAL
Application
: Cleaning � � � � �
4-8. HYDROGEN PEROXIDE (� � � � � � � � � � �`�� � - H2O2) / MITSUBISHI CHEMICAL
Application
: � � ��~� � � � � � � � ��~, � � � ��~� � ��� � � � ��~� ��~� � � ��~� ��~ � � � �
4-10. ACETIC ACID (� � � � ) / MITSUBISHI CHEMICAL
Application
: � � � � � � ��}� � � � � � ��� � ��}� �
4-11. MC-1 / MITSUBISHI CHEMICAL
Application
: � � �(}� � � � � � � } � � � � � � � � � � � �
4-12.
� � ��� � (H3PO4) 85% /
RIN KAGAKU KOGYO
Application
: � � � � � � � � � � � � � � � �
4-13.
Machine /
TOKUYAMA
� � VAPOR
DRYER
� � � � ��{� � ��{
� � ��{� � � � � � � }
� � IPA
GAS MONITER
� � � � � �
� � � � � ��~�
� � � � � � ��{
� � � � � � � � � �x{ � � � � � ��~�
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